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CNC for Vacuum Chambers

UHV hardware.
Helium leak tight.
Semiconductor grade.

CNC machining for vacuum chamber manufacturers and research labs. UHV (ultra-high vacuum) chamber bodies, conflat flanges, feedthrough hardware, internal fixturing. 316L stainless, OFE copper, aluminum 6061-T6. Helium leak-tested assemblies to 10⁻¹² mbar·L/s.

UHV clean CF / KF / ISO-K Helium leak <10⁻¹² 316L / OFE Cu
01 · Vacuum hardware types

Vacuum component categories.

Different pressure levels require different manufacturing approaches. Rough vacuum uses different standards than UHV. Here's what we build across the range.

UHV chamber bodies

316L · <10⁻¹⁰ mbar

Ultra-high vacuum chamber welded 316L bodies. Electropolished interior for low outgassing. CF flange ports standard.

Conflat (CF) flanges

316L · metal gasket

OFE copper gasket sealed CF flanges DN16 to DN250. Knife-edge sealed, bakable to 450 °C, UHV compatible.

KF quick-connect

316L / Al · elastomer

KF clamp-type flanges for rough vacuum and high vacuum (down to 10⁻⁸ mbar). Elastomer sealed, quick assembly.

ISO-K flanges

316L · rough vacuum

ISO-K clamped large-diameter flanges for rough and high vacuum applications.

Electrical feedthroughs

316L + Kovar + glass

Electrical feedthroughs with glass-to-metal hermetic seals. Custom pin patterns for research applications.

Internal fixturing

316L · clean

Sample stages, heaters, cooling blocks. Manufactured to UHV-compatible cleanliness standards.

View ports

316L + fused silica

Optical view ports with fused silica or sapphire windows. Standard and custom sizes.

Manipulators

316L · bellows

Bellows-sealed mechanical feedthroughs for linear and rotary motion in vacuum.

Cryogenic interfaces

OFE Cu + 316L

Liquid nitrogen and helium cooling interfaces. Copper for thermal, stainless for structural.

02 · Vacuum customers

Vacuum customers we serve.

Semiconductor fabs

Chamber components for etch, deposition, lithography systems

Research universities

University physics and materials science research — custom UHV hardware

National laboratories

Oak Ridge, Argonne, Lawrence Berkeley — specialty vacuum hardware

Particle accelerator facilities

Beam line components, cryogenic hardware for particle accelerators

Fusion research

ITER, private fusion companies — ultra-clean fusion reactor internals

Mass spectrometers

Mass spec OEM supply chain — ion optics, analyzer hardware

Electron microscopes

SEM and TEM manufacturers — sample stages, column components

Space simulation

Space simulation chambers at aerospace companies and labs

Analytical instruments

XPS, Auger, LEED instrument OEMs — vacuum system components

FAQ

Vacuum Hardware questions.

UHV (below 10⁻⁹ mbar) requires extreme cleanliness. Our UHV workflow: machining in dedicated area, ultrasonic cleaning (acetone, then IPA, then DI water), final vacuum-bake at 250 °C, packaging in particle-free bags in clean environment. All handling with lint-free gloves. For critical semiconductor and research applications, documented cleaning procedure with test results.
316L stainless: workhorse for chambers and fittings. Low outgassing, weldable, corrosion resistant. OFE copper C101: for gaskets (CF seals) and thermal components — high purity prevents hydrogen embrittlement. Aluminum 6061-T6: for less critical chamber components — lighter, cheaper, adequate for high-vacuum applications. Never use free-machining materials (leaded alloys) in vacuum — volatile additives cause contamination.
CF flanges: knife-edge seals into OFE copper gasket when bolted. Manufacturing requires: precision knife-edge geometry (height 0.9-1.1 mm typical, ±0.02 mm tolerance), flat sealing face (<0.005 mm), hardened to resist gasket indentation (stainless typically 30+ HRC in heat-affected zone). Our CF flanges tested to UHV compatibility and helium leak tightness.
Standard quality check for UHV hardware. Helium leak detector (mass spectrometer tuned to He mass 4) tests assemblies at 10⁻¹² mbar·L/s sensitivity. Pass criterion varies by application — semiconductor typically 10⁻¹⁰ or better, research UHV 10⁻¹¹ or better. We can coordinate leak testing at our location or ship with customer-performed leak test as standard.
UHV chamber interiors must have minimal outgassing — trapped gases in surface porosity release slowly under vacuum, limiting achievable pressure. Electropolishing removes the surface layer where gas was trapped, producing a clean, low-outgassing surface. Standard for UHV chambers requiring <10⁻¹⁰ mbar base pressure. Our chamber bodies electropolished as standard for UHV applications.
Standard CF flanges and fittings: 2-3 weeks. Custom chamber bodies with welding: 6-10 weeks. Complete chamber assembly with internals: 8-16 weeks. Specialty feedthroughs (glass-to-metal custom): 8-12 weeks. Plan ahead for UHV research programs — vacuum hardware often has longer lead times than customers expect.
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